The growth of the hydrogen peroxide market is driven by its exceptional properties, leading to its wide usage as an antiseptic, bleaching agent, and oxidant, along with rising demand from key end-user industries like mining, water treatment, and paper & pulp, says this report.
Read Press ReleaseBRUTE™ Peroxide enables dry peroxide gas delivery for ALD Oxide Growth. RASIRC today released research results showing that anhydrous hydrogen peroxide gas enables a five-fold increase in surface hydroxyl density when compared to water in studies involving ALD nucleation on SiGe substrates. Hydroxyl density is an important factor in minimizing interfacial defects, increasing uniformity and improving next generation semiconductor device performance.
Read Press ReleaseRASIRC BRUTE™ Peroxide delivers water-free H2O2 to enable new ALD reactions. BRUTE Peroxide is the only commercially available technology that can deliver up to 99.9% H2O2 gas by volume. In comparison, traditional H2O2 vaporizers typically deliver less than 1% H2O2 gas by volume from standard H2O2 liquid source. High concentration H2O2 gas improves wafer coverage density over water by as much as three times, leading to better initial growth rates and fewer defects.
Read Press ReleaseRASIRC to present posters and exhibit (Booth #39) at 15th Int'l Conference on Atomic Layer Deposition & ALE Workshop. The companies will showcase hydrogen peroxide gas with or without water. Posters are entitled "In-Situ Monitoring of Hydrogen Peroxide Vapor Delivery Systems for ALD" and "Novel Hydrogen Peroxide Delivery Systems for Atomic Layer Cleaning and Etch".
Read Press ReleaseThe Peroxidizer is a high concentration hydrogen peroxide vaporizer designed specifically for the needs of next generation semiconductor processes, including ALD, annealing, cleaning and etching. The Peroxidizer is the first commercial vaporizer capable of delivering concentrations greater than 5% H2O2 gas by volume from 30% H2O2 liquid source.
Read Press ReleaseRASIRC announced independent test results that show high purity hydrogen peroxide vapor delivered to process by RASIRC technology enables removal of carbon-based contaminants from Germanium surfaces.
Read Press ReleaseRASIRC®, the leader in delivery of dynamic vapors, announced that the company will discuss delivery of ultra high purity hydrogen peroxide vapor at the upcoming 12th International UCPSS Symposium, September 21-24, 2014 in Brussels, Belgium.
Read Press ReleaseRASIRC® will begin public discussions on its new Dry Peroxide(TM) vapor delivery system at the upcoming Atomic Layer Deposition (ALD) conference and will present a poster "New Hydrogen Peroxide Vapor Delivery Systems for Surface Preparation and AL
Read Press ReleaseRabbi Cantor Lawrence Eliezer Kepecs, a religious leader, teacher, and motivator, tries many different techniques, & discovers a home treatment for various maladies that worked each time he and his family tried it.
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