RASIRC® will showcase its products and innovations at the SemiconWest/ Intersolar North America 2013 conference and exhibition. The company will be in the MATHESON booth (#8711) and available for presentations on their new H2O2 vapor technology.

RASIRC® presented a poster on the topic "New Vaporization Sources for H2O2 for Pre-Treatment and Cleaning of ALD Deposition Surfaces" at the recent Advanced Semiconductor Manufacturing Conference.

RASIRC presented "New Vaporization Source for H2O2 for Pre-Treatment/Cleaning of ALD Deposition Surfaces" at Sematech Surface Preparation & Cleaning Conf., showing advantages of dry chemistries to address contamination & reduce chemical consumpti