RASIRC Presents New Hydrogen Peroxide (H2O2) Vapor Source for Pre-Treatment/Cleaning in Atomic Layer Deposition at Advanced Semiconductor Manufacturing Conf
RASIRC® presented a poster on the topic "New Vaporization Sources for H2O2 for Pre-Treatment and Cleaning of ALD Deposition Surfaces" at the recent Advanced Semiconductor Manufacturing Conference.
San Diego (I-Newswire) June 26, 2013 - RASIRC® presented a poster on the topic "New Vaporization Sources for H2O2 for Pre-Treatment and Cleaning of ALD Deposition Surfaces" at the recent Advanced Semiconductor Manufacturing Conference. The SEMI conference was held May 13-16, 2013 in Saratoga Springs, New York.
Defects at or close to the interface between high-k dielectric and channel materials are major concerns for performance and reliability of molecular-level semiconductor devices. Cleaning and surface preparation are important steps in preventing these defects, and are best conducted with dry rather than wet chemistries to ensure complete ALD coverage and avoid etching or structural damage during the process. Hydrogen peroxide delivered with a stable flow rate and sufficient concentration is superior to ozone and water for this application.
"Using H2O2 vapor provides several key advantages, including lower process temperature, higher reactivity with precursor materials, and faster process speed via reduced steric hindrance," said Jeffrey Spiegelman, Founder and President of RASIRC. "New oxidants have been needed in ALD for a long time, but RASIRC is the first company to provide a safe and reliable way to enable H2O2 in ALD."
Historically, Raoult's Law caused the concentration of H2O2 in the vapor to change over time. Unfortunately most researchers were unaware that the H2O2 concentration in the bubbled vapor was in the ppm value not percentage as in the liquid source. This has led to misconceptions on the effectivity of H2O2 in ALD. RASIRC technology overcomes these limitations.
RASIRC tests show that hydrogen peroxide in ALD applications achieve much greater density of hydroxyl sites surface coverage for metal nucleation, speeding the deposition process. Hydrogen peroxide has also been shown to remove carbon from Ge and SIGe substrates. The chemisorption process leads to better interface layers and improved coverage per cycle. Test results were described in the poster.
The Advanced Semiconductor Manufacturing Conference provides a venue for industry professionals to network, learn and share knowledge on new and best-method semiconductor manufacturing practices and concepts. "As devices have incorporated layers only three to five atoms thick the need for better cleaning and surface preparation has grown," said Lita Shon-Roy, RASIRC Director of Marketing and ASMC poster presenter. "Our poster session showed attendees how hydrogen peroxide is now a viable and attractive option for their ALD process."
More information about hydrogen peroxide vapor delivery systems is available directly from RASIRC.
RASIRC products purify and deliver ultra-pure liquids and gases. RASIRC technology is the first to More..generate ultra high purity (UHP) steam from de-ionized water. It reduces cost, increases yield, and improves safety. RASIRC humidifiers, closed loop humidification systems, and steam generators are of critical importance for many applications in the semiconductor, photovoltaic, pharmaceutical, medical, biological, fuel cell, and power industries.Less..
7815 Silverton Avenue
San Diego, CA
Phone : 858-259-1220
Published On:June 26, 2013
Print Release:Print Release
If you have questions regarding information in this press release contact the company listed above. I-Newswire.com is a press release service and not the author of this press release.The information that is on or available through this site is for informational purposes only and speaks only as of the particular date or dates of that information. As some companies and PR Agencies submit their press releases once per week,month or quarter, make sure to check the official company website for accurate release dates as our site displays the I-Newswire.com press release distribution date only.We do not guarantee the accuracy or completeness of information on or available through this site, and we are not responsible for or omissions in that information or for actions taken in reliance on that information.
Virto Commerce Announces Integration with Kooboo CMS
Italian Card Solutions Company Infordata Sistemi, Launches the English Section in Its Official Website
Take The Show Outside Introduces Waterproof Television for Secure View
New BackupAgent Cloud Enables Hosted Backup Services Worldwide
China's SSDs Market Anticipated to Reach 44 Million Units by the End of 2018 Says TechSci Research